Multi-Project Wafer Runs and Dedicated Wafer Runs for Transistors and Integrated Circuits (ICs)
Based on our epitaxial and technological capabilities, Fraunhofer IAF offers electronic multi-project wafer runs (MPW) and complete mask processing for external customers. Both front and back side processing is possible. The runs are offered on a regular basis every four months. For further information about the timing of our wafer runs feel free to contact us.
The IC designs are processed on four-inch wafers including all process steps, the full back side process, measurement technology, inspection and dicing. The design work can also be commissioned at Fraunhofer IAF.
Access is supported by process design kits (PDKs) in the Keysight design environment ADS after completion of an NDA and checking the availability and discussing your individual requirements of the ICs to be designed.