Analysis of semiconductor materials

Material analysis for semiconductor layers and heterostructures


The Fraunhofer IAF has a number of analytical methods for the chemical and structural characterization of bulk semiconductors, semiconductor heterostructures and thin-film systems. These are supplemented by optical analysis techniques.

Please contact us to discuss your individual requirements.

 

 

  • High-resolution X-ray diffractometry (HRXRD) on thin layers
  • X-ray reflectometry (XRR)
  • X-ray μ-computer tomography (X-ray microscopy)
  • Secondary Ion Mass spectrometry
  • photoluminescence spectroscopy
  • Spectroscopic ellipsometry